Substrate Conformal Imprint lithography (SCIL) is a Nano Imprint Lithography (NIL) technique that combines the advantages of a soft working composite stamp for large area patterning of nano structures. The system can produce features as small as 30nm on a 200mm diameter wafer. This technique uses a soft stamp made from a liquid silicone rubber, which is poured over a master pattern and thermally cured at 50°C to form a rubber, poly-di-methyl siloxane (PDMS) stamp, which is peeled from the master. SCIL master stamps is used to develop defined nano-patterns for the applcations of Thin silicon solar cells for better light management.